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● Mature exposure optical system, customised high-quality light sources according to the field process.
● Adopt a self-developed parallel adjustment mechanism, which can set the proximity gap between the mask and the substrate with high precision.
● Optional bottom alignment function (BSA), the alignment accuracy is better than ±2 μm.
● High production beat, the company has a senior automation team to realise the industry-leading equipment production capacity efficiency.
● A large number of additional functions and customised functions can meet diversified process requirements, and can also realise fully automatic AGV / In-Line production methods.
| Performance name | Technical indicators |
| Substrate size | ≤200*200mm |
| Substrate thickness | ≤3mm |
| Exposure mode | Soft contact, hard contact, vacuum exposure |
| Resolution | 5um |
| Counterpoint accuracy | 0.8um |
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